OYAMA, Japan–(BUSINESS WIRE)–Gigaphoton Inc. (Head Office: Oyama, Tochigi; President & CEO: Hitoshi Tomaru; www.gigaphoton.com), a leading manufacturer of light sources used in lithography, has announced that its helium-free technology has made it possible to achieve a 10,000 kiloliter annual reduction of helium gas consumed by high-output ArF immersion excimer lasers (hereinafter, “ArF lasers”). In line with its EcoPhoton™ program*, Gigaphoton has continued to initiate “Green Innovation”